Re: Photogravure with photopolymer

Peter Marshall (petermarshall@cix.compulink.co.uk)
Sat, 30 Dec 95 19:42 GMT

In-Reply-To: <v01530500ad0974a27d2a@[130.225.200.51]>

<< The new photogravure method, which is based on photopolymer rather than
on
copper as its substrate, was developed by the Danish lithographer Eli
Poinsaing, and is described in detail in his book "Photopolymergravure: A
New Method", Copenhagen: Borgen, 1995 (ISBN 87-21-00396-3, appr. $35.-;
written in both Danish and English). The basic elements are as follows:
=46irst a very fine stochastic raster, and subsequently a continuous-tone
positive, are contact exposed by UV light onto a sheet of photopolymer,
which consists of a thin steel base covered with a light sensitive nylon
resin; this resin is water soluble before exposure, and hardens - to
various degrees - after exposure. 'Development' of the 'plate' takes place
in plain water (about 20 dgr C); after a short soak the plate is gently
brushed with a so-called painting cushion, and finally sluiced briefly with
cold water. After drying and a final hardening UV exposure, the plate may
be printed as an ordinary copper etching. - Notice that no chemicals
whatsoever are involved in the preparation of the printing plate.
>>

It would be very interesting to have more details, particularly of the
actual nylon resin concerned (and details of how to get it.)
The process may be similar to that developed by Keith Howard (Safe Photo
Etching for Photographers and Artists, Wynne Resources Lrd, 1991 ISBN
0-9695577-0-1) which I and others have previously mentioned here.

Peter Marshall
petermarshall@cix.compulink.co.uk