Re: Unsharp masking with litho film?

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From: C Downs (fardog@mindspring.com)
Date: 09/21/01-08:00:24 PM Z


Sorry I'm a few days late on this one but just got home.
    I used the TmaxRS developer for two minutes diluted 1 to 4, 1to 1 and 1
to 8 and had some fair results when I ran out of the panmasking film a
couple of years ago. I had not tried the HP-FP or Tmax films yet for masking
so used what I had on hand. I do think it could be used but did not pursue
it but a couple of printing sessions. It works well as far as the mask and
tonality are concerned but I could not get even processing and longer times
gave me too much contrast. I use it for highlight masks in color printing
and get a nice three stop range with dilute film developers.

-----Original Message-----
From: Sandy King <sanking@clemson.edu>
To: alt-photo-process-l@sask.usask.ca <alt-photo-process-l@sask.usask.ca>
Date: Friday, September 21, 2001 11:27 PM
Subject: Unsharp masking with litho film?

It is a well-known fact that virtually everyone on this list masks
perfect negatives that print, regardless of process, with no need for
print controls such as dodging and burning. I wonder, however, if
anyone on the list has any experience in using litho film for making
unsharp masks for contact printing. I was thinking that perhaps Dave
Soemark's LC-1 and LC-1B low contrast developers could be used with
APH film for this purpose. If anyone has any actual experience with
this kind of work or would like to offer theoretical advice I would
be most interested in hearing from you.

Purely theoretical question of course, since I of course always make
perfect negatives!!

Sandy King


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